High-Performance Si Nanowire Transistors on Fully Si Bulk Substrate From Top-Down Approach: Simulation and FabricationJING ZHUGE; YU TIAN; RUNSHENG WANG et al.IEEE transactions on nanotechnology. 2010, Vol 9, Num 1, pp 114-122, issn 1536-125X, 9 p.Article

Method of printing 100-nm random interconnect Pattern with alt-PSMJING LU; BAOQIN CHEN; MING LIU et al.SPIE proceedings series. 2005, pp 55-62, isbn 0-8194-5600-4, 8 p.Conference Paper

A novel method to overcome photoresist collapse with high aspect ratio structuresMINGYAN YU; SHIRUI ZHAO; CHAOQUN GAO et al.Microsystem technologies. 2014, Vol 20, Num 12, pp 2185-2189, issn 0946-7076, 5 p.Article

A novel source/drain on void (SDOV) MOSFET implemented by local co-implantation of hydrogen and heliumDAKE WU; RU HUANG; WEIHAI BU et al.Microelectronic engineering. 2008, Vol 85, Num 7, pp 1490-1494, issn 0167-9317, 5 p.Article

Quasi-SOI MOSFETs- : A promising bulk device candidate for extremely scaled eraYU TIAN; HAN XIAO; RU HUANG et al.I.E.E.E. transactions on electron devices. 2007, Vol 54, Num 7, pp 1784-1788, issn 0018-9383, 5 p.Article

Process study of ZEP520 positive electron-beam resist and its application in single-electron transistorSHIBING LONG; ZHIGANG LI; XINWEI ZHAO et al.SPIE proceedings series. 2005, pp 255-266, isbn 0-8194-5600-4, 12 p.Conference Paper

Comparison of discrete-storage nonvolatile memories : advantage of hybrid method for fabrication of Au nanocrystal nonvolatile memoryQIN WANG; RUI JIA; WENSHENG LU et al.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 3, issn 0022-3727, 035109.1-035109.5Article

Fabrication of Quantum Dot Array Diffraction Grating for Soft X-ray SpectroscopyMIN ZHAO; XIAOLI ZHU; BAOQIN CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, Vol 6724, pp 67241O.1-67241O.7, issn 0277-786X, isbn 978-0-8194-6881-9 0-8194-6881-9, 1VolConference Paper

Analysis of Property of HSQ in Electron Beam LithographyMIN ZHAO; XIAOLI ZHU; BAOQIN CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 682728.1-682728.6, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

The application of optical resolution enhancement technology & E-beam direct writing technology in micro-fabricationYULIN QIU; BAOQIN CHEN; LING LI et al.SPIE proceedings series. 2005, pp 353-364, isbn 0-8194-5600-4, 12 p.Conference Paper